Use of supramolecular assemblies as lithographic resists by Scott M. Lewis, Antonio Fernandez-Mato, Guy A. DeRose, Matthew S. Hunt, George F. Whitehead, Agnese Lagzda, Hayden R. Alty, Jesus Ferrando-Soria, Sarah Varey, Andreas K. Kostopoulos, Fredrik Schedin, Christopher A. Muryn, Grigore A. Timco, Axel Scherer, Stephen G. Yeates, Richard E. Winpenny

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