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    Oxygen plasma cleaning of copper for photocathode applications: A MEIS and XPS study

    Oxygen plasma cleaning of copper for photocathode applications: A MEIS and XPS study by TCQ Noakes, R Valizadeh, AN Hannah, LB Jones, BL Militsyn, Sonal Mistry, Michael Cropper, A Rossall, JA Van den Berg

    Published 2022
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