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六齿八羟基喹啉锰类配合物催化二甲亚砜的氧化消除
by
谢芳
,
伏再辉
,
衷晟
,
叶正培
,
周小平
,
刘凤兰
,
卢春丽
,
荣春英
,
毛利秋
,
尹笃林
Published in
催化学报
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Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering
by
黄福培 杨麒正 叶超 葛水兵 宁兆元
Published in
Plasma science & technology
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Plasma Science & Technology
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催化学报
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等离子体科学和技术:英文版
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