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Search Results - 张金 刘玉岭 闫辰奇 何彦刚 高宝红
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Defectivity control of aluminum chemical mechanical planarization in replacement metal gate process of MOSFET
by
张金 刘玉岭 闫辰奇 何彦刚 高宝红
Published in
Journal of semiconductors
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Journal Of Semiconductors
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半导体学报:英文版
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Subjects
Aluminum
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Chemical Mechanical Planarization
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Cleaning
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Defectivity Control
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Defects
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Gates
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High-K Metal Gate
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Mechanical Polishing
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Mosfet
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Mosfets
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Physical Sciences
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Physics
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Physics, Condensed Matter
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Polishing
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Science & Technology
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Semiconductors
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Surface Morphology
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化学机械平坦化
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化学机械抛光
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工艺
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Institute Of Physics:jisc Collections:iop Publishing Read And Publish 2024-2025 (Reading List)
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