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Search Results - 胡轶 李炎 刘玉岭 何彦刚
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The optimization of FA/O barrier slurry with respect to removal rate selectivity on patterned Cu wafers
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胡轶 李炎 刘玉岭 何彦刚
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Journal of semiconductors
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Planarization effect evaluation of acid and alkaline slurries in the copper interconnect process
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胡轶 李炎 刘玉岭 何彦刚
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Journal of semiconductors
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Journal Of Semiconductors
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半导体学报:英文版
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Physical Sciences
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Physics
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Physics, Condensed Matter
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Polishing
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Science & Technology
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Semiconductors
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Slurries
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Alkaline Slurry
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Barriers
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Chemical Mechanical Planarization
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Chemical Mechanical Polishing
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Chemical-Mechanical Polishing
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Connectors
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Copper
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Demand
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Dielectric Material Characterization
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Dielectrics
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Dishing And Erosion
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Fa/O Alkaline Barrier Slurry
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Integrated Circuits
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Institute Of Physics
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Institute Of Physics Iopscience Extra
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