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Search Results - 蒋勐婷 刘玉岭 袁浩博 陈国栋 刘伟娟
Search Results - 蒋勐婷 刘玉岭 袁浩博 陈国栋 刘伟娟
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Effect of novel alkaline copper slurry on 300 mm copper global planarization
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刘伟娟 刘玉岭 王辰伟 陈国栋 蒋勐婷 袁浩博 程鹏飞
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Journal of semiconductors
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Effect of H2O2 and nonionic surfactant in alkaline copper slurry
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袁浩博 刘玉岭 蒋勐婷 陈国栋 刘伟娟 王胜利
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半导体学报:英文版
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Effect of chelating agent concentration in alkaline Cu CMP process under the condition of different applied pressures
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袁浩博 刘玉岭 蒋勐婷 刘伟娟 陈国栋
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Journal of semiconductors
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Evaluation of planarization performance for a novel alkaline copper slurry under a low abrasive concentration
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蒋勐婷 刘玉岭 袁浩博 陈国栋 刘伟娟
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Journal of semiconductors
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Stability for a novel low-pH alkaline slurry during the copper chemical mechanical planarization
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陈国栋 刘玉岭 王辰伟 刘伟娟 蒋勐婷 袁浩博
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Journal of semiconductors
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Journal Of Semiconductors
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半导体学报:英文版
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Subjects
Physical Sciences
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Physics
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Physics, Condensed Matter
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Science & Technology
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Copper
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Planarization
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Semiconductors
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Slurries
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化学机械平坦化
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Alkaline Slurry
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Cmp
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去除速率
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碱性铜
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Abrasives
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Chelating
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Polishing
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浆料
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磨料浓度
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表面粗糙度
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Abrasive Concentration
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Institute Of Physics:jisc Collections:iop Publishing Read And Publish 2024-2025 (Reading List)
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Institute Of Physics Iopscience Extra
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