Search Results - AJMERA, Hiral M

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  1. 1
    Deposition of WNxCy thin films for diffusion barrier application using the dimethylhydrazido (2―) tungsten complex (CH3CN)Cl4W(NNMe2)

    Deposition of WNxCy thin films for diffusion barrier application using the dimethylhydrazido (2―) tungsten complex (CH3CN)Cl4W(NNMe2) by AJMERA, Hiral M, ANDERSON, Timothy J, KOLLER, Jürgen, MCELWEE-WHITE, Lisa, NORTON, David P

    Published in Thin solid films
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  2. 2
    Synthesis and Characterization of Diorganohydrazido(2–) Tungsten Complexes

    Synthesis and Characterization of Diorganohydrazido(2–) Tungsten Complexes by Koller, Jürgen, Ajmera, Hiral M, Abboud, Khalil A, Anderson, Timothy J, McElwee-White, Lisa

    Published in Inorganic chemistry
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  3. 3
    Tungsten Allylimido Complexes Cl4(RCN)W(NC3H5) as Single-Source CVD Precursors for WNxCy Thin Films. Correlation of Precursor Fragmentation to Film Properties

    Tungsten Allylimido Complexes Cl4(RCN)W(NC3H5) as Single-Source CVD Precursors for WNxCy Thin Films. Correlation of Precursor Fragmentation to Film Properties by BCHIR, Omar J., GREEN, Kelly M., AJMERA, Hiral M., ZAPP, Elizabeth A., ANDERSON, Timothy J., BROOKS, Benjamin C., REITFORT, Laurel L., POWELL, David H., ABBOUD, Khalil A., MCELWEE-WHITE, Lisa

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  4. 4
    Deposition of WNxCy from the Tungsten Piperidylhydrazido Complex Cl4(CH3CN)W(N-pip) as a Single-Source Precursor

    Deposition of WNxCy from the Tungsten Piperidylhydrazido Complex Cl4(CH3CN)W(N-pip) as a Single-Source Precursor by Kim, Dojun, Hyun Kim, Oh, Ajmera, Hiral M., Anderson, Tim, Koller, Jürgen, Abboud, Khalil A., McElwee-White, Lisa

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  5. 5
    Deposition of WN x C y thin films for diffusion barrier application using the dimethylhydrazido (2 −) tungsten complex (CH 3CN)Cl 4W(NNMe 2)

    Deposition of WN x C y thin films for diffusion barrier application using the dimethylhydrazido (2 −) tungsten complex (CH 3CN)Cl 4W(NNMe 2) by Ajmera, Hiral M., Anderson, Timothy J., Koller, Jürgen, McElwee-White, Lisa, Norton, David P.

    Published in Thin solid films
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  6. 6
    Deposition of WN[sub x]C[sub y] Using the Allylimido Complexes Cl[sub 4](RCN)W(NC[sub 3]H[sub 5]): Effect of NH[sub 3] on Film Properties

    Deposition of WN[sub x]C[sub y] Using the Allylimido Complexes Cl[sub 4](RCN)W(NC[sub 3]H[sub 5]): Effect of NH[sub 3] on Film Properties by Ajmera, Hiral M., Heitsch, Andrew T., Bchir, Omar J., Norton, David P., Reitfort, Laurel L., McElwee-White, Lisa, Anderson, Timothy J.

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  7. 7
    Tungsten Allylimido Complexes Cl 4 (RCN)W(NC 3 H 5 ) as Single-Source CVD Precursors for WN x C y Thin Films. Correlation of Precursor Fragmentation to Film Properties

    Tungsten Allylimido Complexes Cl 4 (RCN)W(NC 3 H 5 ) as Single-Source CVD Precursors for WN x C y Thin Films. Correlation of Precursor Fragmentation to Film Properties by Bchir, Omar J., Green, Kelly M., Ajmera, Hiral M., Zapp, Elizabeth A., Anderson, Timothy J., Brooks, Benjamin C., Reitfort, Laurel L., Powell, David H., Abboud, Khalil A., McElwee-White, Lisa

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  8. 8
    Tungsten Allylimido Complexes Cl4(RCN)W(NC3H5) as Single-Source CVD Precursors for WN x C y Thin Films. Correlation of Precursor Fragmentation to Film Properties

    Tungsten Allylimido Complexes Cl4(RCN)W(NC3H5) as Single-Source CVD Precursors for WN x C y Thin Films. Correlation of Precursor Fragmentation to Film Properties by Bchir, Omar J, Green, Kelly M, Ajmera, Hiral M, Zapp, Elizabeth A, Anderson, Timothy J, Brooks, Benjamin C, Reitfort, Laurel L, Powell, David H, Abboud, Khalil A, McElwee-White, Lisa

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  9. 9
    Deposition of W N x C y for diffusion barrier application using the imido guanidinato complex W ( N i Pr ) Cl 3 [ Pr i N C ( N Me 2 ) N i Pr ]

    Deposition of W N x C y for diffusion barrier application using the imido guanidinato complex W ( N i Pr ) Cl 3 [ Pr i N C ( N Me 2 ) N i Pr ] by Ajmera, Hiral M., Heitsch, Andrew T., Anderson, Timothy J., Wilder, Corey B., Reitfort, Laurel L., McElwee-White, Lisa, Norton, David P.

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  10. 10
    Deposition of WNxCy for diffusion barrier application using the imido guanidinato complex W(NiPr)Cl3[PriNC(NMe2)NiPr]

    Deposition of WNxCy for diffusion barrier application using the imido guanidinato complex W(NiPr)Cl3[PriNC(NMe2)NiPr] by Ajmera, Hiral M., Heitsch, Andrew T., Anderson, Timothy J., Wilder, Corey B., Reitfort, Laurel L., McElwee-White, Lisa, Norton, David P.

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