Search Results - ARYUSOOK, K

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  1. 1
    Plasma etching of dielectric films using the non-global-warming gas CF3I

    Plasma etching of dielectric films using the non-global-warming gas CF3I by MISRA, A, SEES, J, HALL, L, LEVY, R. A, ZAITSEV, V. B, ARYUSOOK, K, RAVINDRANATH, C, SIGAL, V, KESARI, S, RUFIN, D

    Published in Materials letters
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  2. 2
    Investigation of CF3I as an Environmentally Benign Dielectric Etchant

    Investigation of CF3I as an Environmentally Benign Dielectric Etchant by Levy, R. A., Zaitsev, V. B., Aryusook, K., Ravindranath, C., Sigal, V., Misra, A., Kesari, S., Rufin, D., Sees, J., Hall, L.

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  3. 3
    Plasma etching of dielectric films using the non-global-warming gas CF 3I

    Plasma etching of dielectric films using the non-global-warming gas CF 3I by Misra, A., Sees, J., Hall, L., Levy, R.A., Zaitsev, V.B., Aryusook, K., Ravindranath, C., Sigal, V., Kesari, S., Rufin, D.

    Published in Materials letters
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  4. 4
    Investigation of CF 3 I as an Environmentally Benign Dielectric Etchant

    Investigation of CF 3 I as an Environmentally Benign Dielectric Etchant by Levy, R. A., Zaitsev, V. B., Aryusook, K., Ravindranath, C., Sigal, V., Misra, A., Kesari, S., Rufin, D., Sees, J., Hall, L.

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