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Characterization of SiO2 films deposited at low temperature by means of remote ICPECVD
by
BOOGAARD, A
,
KOVALGIN, A. Y
,
BRUNETS, I
,
AAMINK, A. A. I
,
HOLLEMAN, J
,
WOLTERS, R. A. M
,
SCHMITZ, J
Published in
Surface & coatings technology
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PureB diode fabrication using physical or chemical vapor deposition methods for increased back-end-of-line accessibility
by
Thammaiah, Shivakumar D.
,
Liu, Xingyu
,
Knežević, Tihomir
,
Batenburg, Kevin M.
,
Aarnink, A.A.I.
,
Nanver, Lis K.
Published in
Solid-state electronics
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Low-temperature LPCVD of Si nanocrystals from disilane and trisilane (Silcore®) embedded in ALD-alumina for non-volatile memory devices
by
Brunets, I.
,
Aarnink, A.A.I.
,
Boogaard, A.
,
Kovalgin, A.Y.
,
Wolters, R.A.M.
,
Holleman, J.
,
Schmitz, J.
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Surface & coatings technology
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Characterization of SiO 2 films deposited at low temperature by means of remote ICPECVD
by
Boogaard, A.
,
Kovalgin, A.Y.
,
Brunets, I.
,
Aarnink, A.A.I.
,
Holleman, J.
,
Wolters, R.A.M.
,
Schmitz, J.
Published in
Surface & coatings technology
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A miniaturized multiwire proportional chamber using CMOS wafer scale post-processing
by
Blanco Carballo, V.M.
,
Chefdeville, M.
,
van der Graaf, H.
,
Salm, C.
,
Aarnink, A.A.I.
,
Smits, S.M.
,
Altpeter, D.M.
,
Timmermans, J.
,
Visschers, J.L.
,
Schmitz, J.
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A Self-aligned Gate Definition Process with Submicron Gaps
by
Warmerdam, L.F.P.
,
Aarnink, A.A.I.
,
Holleman, J.
,
Wallinga, H.
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An 1 GHz All-implanted Vertical pnp Transistor
by
Ragay, F.W.
,
Aarnink, A.A.I.
,
Middelhoek, J.
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