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Study of the profiles of the distribution of atoms of the contacting material over the depth of pure and ion-doped silicon
by
Donaev, S.B.
,
Shirinov, G.M.
,
Ergasheva, S.
,
Rakhimov, A.M.
,
Wang, Shenghao
,
Abduvayitov, A.A.
Published in
E3S Web of Conferences
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Changes in the electronic structure of the Si surface as a result of ion implantation
by
Donaev, S.B.
,
Ziyamukhamedova, U.A.
,
Kenjaeva, M.
,
Shirinov, G.M.
,
Rakhimov, A.M.
,
Abduvayitov, A.A.
Published in
E3S Web of Conferences
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Ion Implantation
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Silicon
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Spectroscopy
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Alloying Elements
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Chemical Bonds
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Diffusion Length
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Electronic Structure
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Etching
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Ion Etching
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Nickel
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Photoelectrons
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