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Activation of shallow B and BF2 implants in Si using Excimer laser annealing
by
Ali-Guerry, Z.
,
Marty, M.
,
Beneyton, R.
,
Moussy, N.
,
Venturini, J.
,
Huet, K.
,
Guo-Neng Lu
,
Dutartre, D.
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Conference Proceedings
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Annealing
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B Activation
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Boron
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Curing
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Doping Profiles
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Electrical Resistance Measurement
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Implants
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Laser Thermal Annealing
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Photoluminescence
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Rough Surfaces
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Shallow Doping
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Surface Morphology
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Surface Roughness
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Ieee Electronic Library (Iel) Conference Proceedings
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Ieee Xplore All Conference Series
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