Search Results - Allgair, J

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  1. 1
    Value-Added Metrology

    Value-Added Metrology by Bunday, B., Allgair, J., Caldwell, M., Solecky, E., Archie, C., Rice, B., Singh, B., Cain, J., Emami, I.

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  2. 2
    Nanoscale patterning of silicon dioxide thin films by catalyzed HF vapor etching

    Nanoscale patterning of silicon dioxide thin films by catalyzed HF vapor etching by Allgair, J, Ryan, J M, Song, H J, Kozicki, M N, Whidden, T K, Ferry, D K

    Published in Nanotechnology
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  3. 3
    Catalyzed HF vapor etching of silicon dioxide for micro- and nanolithographic masks

    Catalyzed HF vapor etching of silicon dioxide for micro- and nanolithographic masks by WHIDDEN, T. K, ALLGAIR, J, RYAN, J. M, KOZICKI, M. N, FERRY, D. K

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  4. 4
    The use of electron beam exposure and chemically enhanced vapor etching of SiO2 for nanoscale fabrication

    The use of electron beam exposure and chemically enhanced vapor etching of SiO2 for nanoscale fabrication by Kozicki, M.N., Allgair, J., Jenkins-Gray, A., Ferry, D.K., Whidden, T.K.

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  5. 5
    The Future of CD Metrology

    The Future of CD Metrology by Allgair, J., Bunday, B.

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  6. 6
    The ROI of Metrology

    The ROI of Metrology by Bunday, B., Allgair, J., Caldwell, M., Archie, C., Solecky, E., Rice, B., Singh, B., Emami, I.

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  7. 7
    Low temperature ZEP-520A development process for enhanced critical dimension realization in reactive ion etch etched polysilicon

    Low temperature ZEP-520A development process for enhanced critical dimension realization in reactive ion etch etched polysilicon by Wang, H., Laws, G. M., Milicic, S., Boland, P., Handugan, A., Pratt, M., Eschrich, T., Myhajlenko, S., Allgair, J. A., Bunday, B.

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  8. 8
    Nanoscale patterning of silicon dioxide thin films by catalyzed HF vapor etching : Ordered molecular and nanoscale electronics

    Nanoscale patterning of silicon dioxide thin films by catalyzed HF vapor etching : Ordered molecular and nanoscale electronics by ALLGAIR, J, RYAN, J. M, SONG, H. J, KOZICKI, M. N, WHIDDEN, T. K, FERRY, D. K

    Published in Nanotechnology
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  9. 9
    Matching automated CD SEMs in multiple manufacturing environments

    Matching automated CD SEMs in multiple manufacturing environments by Allgair, J., Ruehle, D., Miller, J., Elliot, R.

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  10. 10
    Nanoscale lithography with electron exposure of SiO2 resists

    Nanoscale lithography with electron exposure of SiO2 resists by WHIDDEN, T. K, ALLGAIR, J, JENKINS-GRAY, A, MAROUN KHOURY, KOZICKI, M. N, FERRY, D. K

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  11. 11
    Phenomenology of ArF photoresist shrinkage trends

    Phenomenology of ArF photoresist shrinkage trends by Bunday, Benjamin, Cordes, Aaron, Allgair, John, Piscani, Emil, Rice, Bryan J., Avitan, Yohanan, Peltinov, Ram, Adan, Ofer

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