Talking after school: Parents’ conversational styles and children’s memory for a science lesson by Leichtman, Michelle D., Camilleri, Kaitlin A., Pillemer, David B., Amato-Wierda, Carmela C., Hogan, Jennifer E., Dongo, Melissa D.

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Kinetics and mechanism relevant to TiSiN chemical vapor deposition from TDMAT, silane and ammonia by Norton, Edward T, Amato-Wierda, Carmela C

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Chemical vapor deposition of TiWC thin films by Ji, Hua Xia, Amato-Wierda, Carmela C

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Gas phase analysis of TiCl4 plasma processes by molecular beam mass spectrometry by WIERDA, Derk Andrew, REDDY, Chandra M, AMATO-WIERDA, Carmela C

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Silane Activation by Ti(NMe2)4 and NH3 during Chemical Vapor Deposition of Ti−Si−N Films by Amato-Wierda, Carmela C, Norton, Edward T, Wierda, Derk A

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Gas phase analysis of TiCl 4 plasma processes by molecular beam mass spectrometry by Wierda, Derk Andrew, Reddy, Chandra M, Amato-Wierda, Carmela C

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Silane Activation by Ti(NMe 2 ) 4 and NH 3 during Chemical Vapor Deposition of Ti−Si−N Films by Amato-Wierda, Carmela C., Norton, Edward T., Wierda, Derk A.

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Pulsed Laser Deposition of Carbide Coatings for Rolling and Sliding Contact Applications by Krzanowski, James F, Gross, Todd S, Amato-Wierda, Carmela C, Echt, Olof

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Kinetic and Mechanistic Studies of the Thermal Decomposition of Ti(N(CH3)2)4 during Chemical Vapor Deposition by in Situ Molecular Beam Mass Spectrometry by Norton, Edward T, Amato-Wierda, Carmela

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Chemical vapor deposition of titanium nitride thin films from tetrakis(dimethylamido)titanium and hydrazine as a coreactant by Amato-Wierda, Carmela, Wierda, Derk A.

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Theme-Based Exams in General Chemistry by Amato-Wierda, Carmela

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Enhanced bulk polysilicon production using silicon tubes by Jafri, Ijaz, Chandra, Mohan, Zhang, Hui, Prasad, Vish, Reddy, Chandra, Amato-Wierda, Carmela, Landry, Marc, Ciszek, Ted

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Low Temperature Chemical Vapor Deposition of Titanium Nitride Thin Films with Hydrazine and Tetrakis(dimethylamido)titanium by Amato-Wierda, Carmela

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