Search Results - Antoun, Gaëlle

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  1. 1
    Comparison between Bosch and STiGer Processes for Deep Silicon Etching

    Comparison between Bosch and STiGer Processes for Deep Silicon Etching by Tillocher, Thomas, Nos, Jack, Antoun, Gaëlle, Lefaucheux, Philippe, Boufnichel, Mohamed, Dussart, Rémi

    Published in Micromachines (Basel)
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  2. 2
    Mechanism understanding in cryo atomic layer etching of SiO2 based upon C4F8 physisorption

    Mechanism understanding in cryo atomic layer etching of SiO2 based upon C4F8 physisorption by Antoun, G., Tillocher, T., Lefaucheux, P., Faguet, J., Maekawa, K., Dussart, R.

    Published in Scientific reports
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  3. 3
    Cryo atomic layer etching of SiO 2 by C F8 physisorption followed by Ar plasma

    Cryo atomic layer etching of SiO 2 by C F8 physisorption followed by Ar plasma by Antoun, Gaelle, Lefaucheux, Philippe, Tillocher, Thomas, Dussart, Rémi, Yamazaki, Kumiko, Yatsuda, Koichi, Faguet, Jacques, Maekawa, Kaoru

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  4. 4
    Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF 4 /O 2 and Ar plasmas

    Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF 4 /O 2 and Ar plasmas by Antoun, Gaelle, Tillocher, Thomas, Girard, Aurélie, Lefaucheux, Philippe, Faguet, J., Kim, H., Zhang, D., Wang, M., Maekawa, K., Cardinaud, Christophe, Dussart, Rémi

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  5. 5
    The role of physisorption in the cryogenic etching process of silicon

    The role of physisorption in the cryogenic etching process of silicon by Antoun, G., Dussart, R., Tillocher, T., Lefaucheux, P., Cardinaud, C., Girard, A., Tahara, S., Yamazaki, K., Yatsuda, K., Faguet, J., Maekawa, K.

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  6. 6
    Synthesis and Characterization of a Thermoresponsive Polyoxometalate-Polymer Hybrid

    Synthesis and Characterization of a Thermoresponsive Polyoxometalate-Polymer Hybrid by Rieger, Jutta, Antoun, Tarek, Lee, Soo-Hyon, Chenal, Marion, Pembouong, Gaëlle, Lesage de la Haye, Jennifer, Azcarate, Iban, Hasenknopf, Bernold, Lacôte, Emmanuel

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