Novel Diamantane Polymer Platform for Resist Applications by Padmanaban, Murirathna, Chakrapani, Srinivasan, Lin, Guanyang, Kudo, Takanori, Parthasarathy, Deepa, Anyadiegwu, Clement, Antonio, Charito, Dammel, Ralph, Liu, Shenggao, Lam, Feederick, Maehara, Takayuki, Iwasaki, Fimiaki, Yamaguchi, Masao

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Influence of ArF Resist Components and Process Conditions on the PEB Sensitivity by Padmanaban, Munirathna, Anyadiegwu, Clement, Kanda, Takashi, Kim, Woo-Kyu, Kudo, Takanori, McKenzie, Douglas, Rahman, Dalil, Dammel, Ralph, Lee, SangHo

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Effect of Amine Additives on LWR and LER as Studied by Extraction Parameters by Houlihan, Francis M., Rentkiewicz, David, Lin, Guanyang, Rahman, Dalil, Mackenzie, Dougls, Timko, Allen, Kudo, Takanori, Anyadiegwu, Clement, Thiyqarqjan, Muthiah, Chiu, Simon, Romano, Andrew, Dammel, Rqlph R., Padmanaban, Murirathna

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193 nm Resist Line Collapse Study by Modifying the Resist Polymer and Process Conditions with Utilizing FIRM Process by Tanaka, Keiichi, Yamada, Yoshiaki, Masuda, Seiya, Kobayashi, Masakazu, Kim, Woo-Kyu, Anyadiegwu, Clement, Padamanaban, Murirathna, Dammel, Ralph R.

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Development of Spin-on High Carbon Hard Masks for High Resolution Photolithography by Lin, Guanyang, Rahman, M. Dalil, Caho, Joon Yeon, Sahn, Jianhui, Yi, Yi, Mckenzie, Douglas

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Browning in processed yams: peroxidase or polyphenol oxidase by Chilaka, Ferdinand C, Eze, Sabinus, Anyadiegwu, Clement, Uvere, Peter O

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