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The influence of thickness and ammonia flow rate on the properties of AlN layers
by
Aoerekci, S
,
Azturk, M K
,
Aakmak, M
,
Azcelik, S
,
Azbay, E
Published in
Materials science in semiconductor processing
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Materials Science In Semiconductor Processing
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Subjects
Aln Thin Films
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Aluminum Nitride
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Ammonia
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Ammonia Flow Rate
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Applied Sciences
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Asymmetry
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Chemical Vapor Deposition
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Condensed Matter: Structure, Mechanical And Thermal Properties
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Cross-Disciplinary Physics: Materials Science; Rheology
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Crystallinity
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Diffraction
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Electronics
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Engineering
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Engineering, Electrical & Electronic
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Exact Sciences And Technology
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Flow Rate
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Materials Science
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Materials Science, Multidisciplinary
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Methods Of Deposition Of Films And Coatings; Film Growth And Epitaxy
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Microelectronic Fabrication
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Sciencedirect
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Sciencedirect Freedom Collection 2022-2024
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