Search Results - Austin, Dustin Z.

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  1. 1
    Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor

    Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor by Austin, Dustin Z, Jenkins, Melanie A, Allman, Derryl, Hose, Sallie, Price, David, Dezelah, Charles L, Conley, John F

    Published in Chemistry of materials
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  2. 2
    Laminate Al2O3/Ta2O5 Metal/Insulator/Insulator/Metal (MIIM) Devices for High-Voltage Applications

    Laminate Al2O3/Ta2O5 Metal/Insulator/Insulator/Metal (MIIM) Devices for High-Voltage Applications by Jenkins, Melanie A., Austin, Dustin Z., Holden, Konner E. K., Allman, Derryl, Conley, John F.

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  3. 3
    Correction to Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero Oxidation State Precursor

    Correction to Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero Oxidation State Precursor by Austin, Dustin Z, Jenkins, Melanie A, Allman, Derryl, Hose, Sallie, Price, David, Dezelah, Charles L, Conley, John F

    Published in Chemistry of materials
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  4. 4
    Assessment of Energy Barriers Between ZrCuAlNi Amorphous Metal and Atomic Layer Deposition Insulators Using Internal Photoemission Spectroscopy

    Assessment of Energy Barriers Between ZrCuAlNi Amorphous Metal and Atomic Layer Deposition Insulators Using Internal Photoemission Spectroscopy by Jenkins, Melanie A., Klarr, Tyler, Austin, Dustin Z., Li, Wei, Nguyen, Nhan V., Conley, John F.

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  5. 5
    Laminate Al 2 O 3 /Ta 2 O 5 Metal/Insulator/Insulator/Metal (MIIM) Devices for High-Voltage Applications

    Laminate Al 2 O 3 /Ta 2 O 5 Metal/Insulator/Insulator/Metal (MIIM) Devices for High-Voltage Applications by Jenkins, Melanie A., Austin, Dustin Z., Holden, Konner E. K., Allman, Derryl, Conley, John F.

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  6. 6
    Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors

    Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors by Austin, Dustin Z., Allman, Derryl, Price, David, Hose, Sallie, Conley, John F.

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  7. 7
    Review-Beyond the Highs and Lows: A Perspective on the Future of Dielectrics Research for Nanoelectronic Devices

    Review-Beyond the Highs and Lows: A Perspective on the Future of Dielectrics Research for Nanoelectronic Devices by Jenkins, Melanie, Austin, Dustin Z., Conley, John F., Fan, Junqing, de Groot, C. H., Jiang, Liudi, Fan, Ye, Ali, Rizwan, Ghosh, Gargi, Orlowski, Marius, King, Sean W.

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  8. 8
    Atomic layer deposition of bismuth oxide using Bi(OCMe2 iPr)3 and H2O

    Atomic layer deposition of bismuth oxide using Bi(OCMe2 iPr)3 and H2O by Austin, Dustin Z., Allman, Derryl, Price, David, Hose, Sallie, Saly, Mark, Conley, John F.

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  9. 9
    Atomic layer deposition of bismuth oxide using Bi(OCMe{sub 2}{sup i}Pr){sub 3} and H{sub 2}O

    Atomic layer deposition of bismuth oxide using Bi(OCMe{sub 2}{sup i}Pr){sub 3} and H{sub 2}O by Austin, Dustin Z., Conley, John F., Allman, Derryl, Price, David, Hose, Sallie, Saly, Mark

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