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Dependence of Analog and Digital Performances on Mechanical Film Stress of ILD Layers in Nanoscale CMOSFETs
by
Ji, Hee-Hwan
,
Park, Sung-Hyung
,
Kim, Yong-Goo
,
Wang, Jin-Suk
,
Lee, Hi-Deok
,
Baek, Seong-Hak
,
Kim, Kyoung-Cheol
,
Song, Byeung-Soo
,
Bae, Hui-Kyoung
,
Lee, Heui-Seung
,
Kang, Young-Seok
,
Kim, Dae-Byung
,
Park, Jin-Won
Published in
Japanese Journal of Applied Physics
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Japanese Journal Of Applied Physics
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Japanese Journal Of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers
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Japanese Journal Of Applied Physics, Part 1: Regular Papers And Short Notes And Review Papers
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Japanese Journal Of Applied Physics. Part. 1, Regular Papers, Brief Communications & Review Papers
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Subjects
Drain R
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Drain Rout
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Film Stress
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Ild Layer
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Interface State Density
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Oxide Fixed Charge
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Physical Sciences
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Physics
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Physics, Applied
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Institute Of Physics Iopscience Extra
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