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Materials and Resists for 193 and 157nm Applications
by
Padmanaban, Munirathna
,
Alemy, Eric
,
Bae, Jun-Bom
,
Kim, Woo-Kyu
,
Kudo, Takanori
,
Masuda, Seiya
,
Rahman, Dalil
,
Sakamuri, Raj
,
Dammel, Ralph
,
Jung, Jae-Chang
,
Lee, Sung-Koo
,
Shin, Ki-Soo
Published in
Journal of Photopolymer Science and Technology
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Layer-Specific Resists for 193nm Lithography
by
Padmanaban, Munirathna
,
Bae, Jun-Bom
,
Kim, Woo-Kyu
,
Kudo, Takanori
,
Rahman, M. Dalil
,
Dammel, Ralph R.
Published in
Journal of Photopolymer Science and Technology
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Journal Of Photopolymer Science And Technology
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Axtm1020P
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157 Nm
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157Nm
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193 Nm Resists
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193Nm
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193Nm Resists
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Ax 1020P
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Ax 1040P
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Axtm 1020P
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Axtm 1040P
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Axtm 2020P
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Axtm1030P Axtm2000P
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Axtm1040P
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Axtm2020P
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Layer Specific
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Line Width Slimming
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Polymers
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Resists
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Shelf Life
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Free Full-Text Journals In Chemistry
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J-Stage (Japan Science & Technology Information Aggregator, Electronic) - Open Access English Articles
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Ezb Electronic Journals Library
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