Search Results - Bando, Kouki

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  1. 1
    Species responsible for Si–H2 bond formation in a-Si:H films deposited using silane high frequency discharges

    Species responsible for Si–H2 bond formation in a-Si:H films deposited using silane high frequency discharges by Shiratani, Masaharu, Koga, Kazunori, Kaguchi, Naoto, Bando, Kouki, Watanabe, Yukio

    Published in Thin solid films
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  2. 2
    Cluster-eliminating filter for depositing cluster-free a -Si:H films by plasma chemical vapor deposition

    Cluster-eliminating filter for depositing cluster-free a -Si:H films by plasma chemical vapor deposition by Koga, Kazunori, Kaguchi, Naoto, Bando, Kouki, Shiratani, Masaharu, Watanabe, Yukio

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  3. 3
    Highly Stable a-Si:H Films Deposited by Using Multi-Hollow Plasma Chemical Vapor Deposition

    Highly Stable a-Si:H Films Deposited by Using Multi-Hollow Plasma Chemical Vapor Deposition by Koga, Kazunori, Inoue, Toshihisa, Bando, Kouki, Iwashita, Shinya, Shiratani, Masaharu, Watanabe, Yukio

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  4. 4
    Species responsible for Si–H 2 bond formation in a-Si:H films deposited using silane high frequency discharges

    Species responsible for Si–H 2 bond formation in a-Si:H films deposited using silane high frequency discharges by Shiratani, Masaharu, Koga, Kazunori, Kaguchi, Naoto, Bando, Kouki, Watanabe, Yukio

    Published in Thin solid films
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  5. 5
    Cluster-eliminating filter for depositing cluster-free a -Si:H filmsby plasma chemical vapor deposition

    Cluster-eliminating filter for depositing cluster-free a -Si:H filmsby plasma chemical vapor deposition by Koga, Kazunori, Kaguchi, Naoto, Bando, Kouki, Shiratani, Masaharu, Watanabe, Yukio

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  6. 6
    Species responsible for Si-H2 bond formation in a-Si:H films deposited using silane high frequency discharges

    Species responsible for Si-H2 bond formation in a-Si:H films deposited using silane high frequency discharges by SHIRATANI, Masaharu, KOGA, Kazunori, KAGUCHI, Naoto, BANDO, Kouki, WATANABE, Yukio

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  7. 7
    Incorporation of Higher-Order Silane Radicals Into A-Si:H Films of High Stability Against Light Exposure

    Incorporation of Higher-Order Silane Radicals Into A-Si:H Films of High Stability Against Light Exposure by Shiratani, M., Iwashita, S., Bando, K., Inoue, T., Koga, K.

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  8. 8
    Development and Validation of a Novel Cuff-Less Blood Pressure Monitoring Device

    Development and Validation of a Novel Cuff-Less Blood Pressure Monitoring Device by Watanabe, Naoki, MD, Bando, Yasuko K., MD, PhD, Kawachi, Taiji, ME, Yamakita, Hiroshi, ME, Futatsuyama, Kouki, MSc, Honda, Yoshikazu, ME, Yasui, Hisae, RN, Nishimura, Kazuyuki, MD, Kamihara, Takahiro, MD, Okumura, Takahiro, MD, PhD, Ishii, Hideki, MD, PhD, Kondo, Takahisa, MD, PhD, Murohara, Toyoaki, MD, PhD

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