Pulsed high-density plasmas for advanced dry etching processes by Banna, Samer, Agarwal, Ankur, Cunge, Gilles, Darnon, Maxime, Pargon, Erwine, Joubert, Olivier

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Reducing damage to Si substrates during gate etching processes by synchronous plasma pulsing by Petit-Etienne, Camille, Darnon, Maxime, Vallier, Laurent, Pargon, Erwine, Cunge, Gilles, Boulard, François, Joubert, Olivier, Banna, Samer, Lill, Thorsten

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Effect of simultaneous source and bias pulsing in inductively coupled plasma etching by Agarwal, Ankur, Stout, Phillip J., Banna, Samer, Rauf, Shahid, Tokashiki, Ken, Lee, Jeong-Yun, Collins, Ken

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Silicon recess minimization during gate patterning using synchronous plasma pulsing by Petit-Etienne, Camille, Pargon, Erwine, David, Sylvain, Darnon, Maxime, Vallier, Laurent, Joubert, Olivier, Banna, Samer

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Impact of Phase Shifted Coil Currents on Plasma Uniformity by Agarwal, A., Banna, S., Todorow, V., Rauf, S., Collins, K.

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Synchronous Pulse Plasma Operation upon Source and Bias Radio Frequencys for Inductively Coupled Plasma for Highly Reliable Gate Etching Technology by Tokashiki, Ken, Cho, Hong, Banna, Samer, Lee, Jeong-Yun, Shin, Kyoungsub, Todorow, Valentin, Kim, Woo-Seok, Bai, KeunHee, Joo, Sukho, Choe, Jeong-Dong, Ramaswamy, Kartik, Agarwal, Ankur, Rauf, Shahid, Collins, Ken, Choi, SangJun, Cho, Han, Kim, Hyun Joong, Lee, Changhun, Lymberopoulos, Dimitris, Yoon, Junho, Han, Woosung, Moon, Joo-Tae

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Storing Energy from External Power Supplies Using Phase Change Materials and Various Pipe Configurations by Aprile, Daniel, Al-Banna, Samer, Maheswaran, Arraventhan, Paquette, Joshua, Saghir, Mohamad Ziad

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Decreasing high ion energy during transition in pulsed inductively coupled plasmas by Agarwal, Ankur, Stout, Phillip J., Banna, Samer, Rauf, Shahid, Collins, Ken

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Effect of water uptake on the fracture behavior of low-k organosilicate glass by Guo, Xiangyu, Jakes, Joseph E., Banna, Samer, Nishi, Yoshio, Leon Shohet, J.

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Atomic-scale silicon etching control using pulsed Cl2 plasma by Petit-Etienne, Camille, Darnon, Maxime, Bodart, Paul, Fouchier, Marc, Cunge, Gilles, Pargon, Erwine, Vallier, Laurent, Joubert, Olivier, Banna, Samer

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Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching by Banna, S., Agarwal, A., Tokashiki, K., Hong Cho, Rauf, S., Todorow, V., Ramaswamy, K., Collins, K., Stout, P., Jeong-Yun Lee, Junho Yoon, Kyoungsub Shin, Sang-Jun Choi, Han-Soo Cho, Hyun-Joong Kim, Changhun Lee, Lymberopoulos, D.

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Experimental observation of direct particle acceleration by stimulated emission of radiation by Banna, Samer, Berezovsky, Valery, Schächter, Levi

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Recouping etch rates in pulsed inductively coupled plasmas by Agarwal, Ankur, Stout, Phillip J., Banna, Samer, Rauf, Shahid, Collins, Ken

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PASER - particle acceleration by stimulated emission of radiation: theory, experiment, and future applications by Banna, S., Mizrahi, A., Schächter, L.

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(Invited) Dielectric Damage by Shohet, J. Leon, Lin, Qinghuang, King, Sean W., Ren, He, Banna, Samer, Jakes, Joseph E., Agasie, Robert J., Naik, Mehul, Nishi, Yoshio, Nichols, Michael T., Mavrakakis, Konstantinos, Hsu, Kaiwen, Guo, Xiangyu, Pei, Dongfei, Li, Weiyi, Choudhury, Faraz, Zheng, Huifeng

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Electromagnetic Characterization of Symmetric and Asymmetric Modes in a Disk-Loaded Structure by Banna, Samer

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Wake-field in an array of metallic posts: Possible application for beam position monitoring by Banna, Samer, Ludwig, Alon, Schächter, Levi

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Optimization of 2.5D Organic Interposer Channel for Die and Chiplets by Sitaraman, Srikrishna, Verhaverbeke, Steven, Banna, Samer, Sowwan, Mukhles, Jiang, Liu, Bazizi, El Mehdi, Ayyagari-Sangamalli, Buvna

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Synchronous Pulsed Plasma for Silicon Etch Applications by Darnon, Maxime, Petit-Etienne, Camille, Pargon, Erwine, Cunge, Gilles, Vallier, Laurent, Bodart, Paul, Haas, Moritz, Banna, Samer, Lill, Thorsten, Joubert, Olivier

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Array of Metallic Posts: Possible Application for Beam Position Monitoring by Banna, Samer, Ludwig, Alon, Schaechter, Levi

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