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hbox\hbox\hbox Channel MOSFETs With Self-Aligned InAs Source/Drain Formed by MEE Regrowth
by
Singisetti, U.
,
Wistey, M.A.
,
Burek, G.J.
,
Baraskar, A.K.
,
Thibeault, B.J.
,
Gossard, A.C.
,
Rodwell, M.J.W.
,
Byungha Shin
,
Kim, E.J.
,
McIntyre, P.C.
,
Bo Yu
,
Yu Yuan
,
Wang, D.
,
Yuan Taur
,
Asbeck, P.
,
Yong-Ju Lee
Published in
IEEE electron device letters
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[Formula Omitted] Channel MOSFETs With Self-Aligned InAs Source/Drain Formed by MEE Regrowth
by
Singisetti, U
,
Wistey, M.A
,
Burek, G.J
,
Baraskar, A.K
,
Thibeault, B.J
,
Gossard, A.C
,
Rodwell, M.J.W
,
Shin, Byungha
,
Kim, E.J
,
McIntyre, P.C
,
Yu, Bo
,
Yuan, Yu
,
Wang, D
,
Taur, Yuan
,
Asbeck, P
,
Lee, Yong-Ju
Published in
IEEE electron device letters
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Enhancement mode In0.53Ga0.47As MOSFET with self-aligned epitaxial source/drain regrowth
by
Singisetti, U.
,
Wistey, M.A.
,
Burek, G.J.
,
Baraskar, A.K.
,
Cagnon, J.
,
Thibeault, B.
,
Gossard, A.C.
,
Stemmer, S.
,
Rodwell, M.J.W.
,
Eunji Kim
,
Byungha Shin
,
McIntyre, P.C.
,
Yong-Ju Lee
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Effect of surface preparations on contact resistivity of TiW to highly doped n-InGaAs
by
Jain, V.
,
Baraskar, A.K.
,
Wistey, M.A.
,
Singisetti, U.
,
Griffith, Z.
,
Lobisser, E.
,
Thibeault, B.J.
,
Gossard, A.C.
,
Rodwell, M.
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