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Tackling residual tensile stress in AlN-on-Si nucleation layers via the controlled Si(111) surface nitridation
by
Milakhin, Denis
,
Malin, Timur
,
Mansurov, Vladimir
,
Maidebura, Yan
,
Bashkatov, Dmitriy
,
Milekhin, Ilya
,
Goryainov, Sergey
,
Volodin, Vladimir
,
Loshkarev, Ivan
,
Vdovin, Vladimir
,
Gutakovskii, Anton
,
Ponomarev, Sergei
,
Zhuravlev, Konstantin
Published in
Surfaces and interfaces
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Surfaces And Interfaces
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Aln Nucleation Layer
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Aln-On-Si
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Ammonia Molecular-Beam Epitaxy
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Chemistry
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Chemistry, Physical
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Crystalline Sin
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Hr-Tem
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Inversion Domains
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Materials Science
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Materials Science, Coatings & Films
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Nitridation
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Physical Sciences
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Physics
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Physics, Applied
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Physics, Condensed Matter
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Raman Spectroscopy
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Residual Tensile Stress
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Rheed
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Science & Technology
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Sciencedirect
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