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Via resistance increase accelerated by thermal stress
by
Qin, Wentao
,
Donaldson, Scott
,
Rogers, Dan
,
Belisle, Chuck
,
Grivna, Gordy
,
Boukhanfra, Lahcen
,
Thiefain, Julien
,
Barrientos, Denise
,
Steinwall, Jim
,
Chang, George
,
Gambino, Jeff
,
Burgin, Rebecca
Published in
Microelectronics and reliability
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Lithography Solutions for a 0.35μm 25V PDMOS Technology
by
Williams, B.
,
Thomason, M.
,
Belisle, C.
,
Greenwood, B.
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RDL manufacturing for flip chip packaging
by
Williams, B.
,
Florence, D.
,
Dalal, H.
,
Gunturu, K.
,
Nelson, M.
,
Belisle, C.
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