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Search Results - Beloto, Antônio Fernando
Search Results - Beloto, Antônio Fernando
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Boron Doped Ultrananocrystalline Diamond Films on Porous Silicon: Morphological, Structural and Electrochemical Characterizations
by
Silva, Lilian Mieko da
,
Santos, Marta dos
,
Baldan, Maurício Ribeiro
,
Beloto, Antonio Fernando
,
Ferreira, Neidenêi Gomes
Published in
Materials research (São Carlos, São Paulo, Brazil)
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Assembly and Testing of a Thermal Control Component Developed in Brazil
by
Boato, Marcos Galante
,
Garcia, Ezio Castejon
,
Santos, Marcio Bueno dos
,
Beloto, Antonio Fernando
Published in
Journal of aerospace technology and management
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Aluminum Implantation in Kapton ® for Space Applications: Magnetic Field Effects on Implantation in Vacuum Arcs
by
Tan, Ing Hwie
,
Ueda, Mario
,
Dallaqua, Renato
,
Rossi, José Osvaldo
,
Beloto, Antonio Fernando
,
Demarquette, Nicole Raymonde
,
Gengembre, Leon
Published in
Japanese Journal of Applied Physics
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Experimental Analysis of the Improved Emission Properties of Glassy β-eucryptite Ion Source
by
Oliveira, Rogério de Moraes
,
Gonçalves, José Américo Neves
,
Ueda, Mário
,
Beloto, Antônio Fernando
Published in
Japanese Journal of Applied Physics
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Corrosion resistance enhancement of SAE 1020 steel after Chromium implantation by nitrogen ion recoil
by
Gomes, Geraldo Francisco
,
Ueda, Mario
,
Beloto, Antonio Fernando
,
Nakazato, Roberto Zenhei
,
Reuther, Helfried
Published in
Materials research (São Carlos, São Paulo, Brazil)
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Short-circuit current distribution in solar cells
by
Nubile, Paulo
,
Beloto, Antonio Fernando
Published in
Solar energy materials and solar cells
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Annealing Effects on Silicon Oxynitride Layer Synthesized by N Plasma Immersion Ion Implantation
by
Ueda, M.
,
Reuther, H.
,
Beloto, A.F.
,
Kuranaga, C.
,
Abramof, E.
Published in
IEEE transactions on plasma science
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Annealing effects on silicon oxynitride layer synthesized by n plasma immersion ion implantation: Plasma-Based Surface Modification and Treatment Technologies
by
UEDA, Mario
,
REUTHER, Helfried
,
BELOTO, Antonio Fernando
,
KURANAGA, Carlos
,
ABRAMOF, Eduardo
Published in
IEEE transactions on plasma science
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