Search Results - Berghuis, Wilhelmus J.H.

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  1. 1
    Surface passivation of germanium by atomic layer deposited Al2O3 nanolayers

    Surface passivation of germanium by atomic layer deposited Al2O3 nanolayers by Berghuis, Wilhelmus J. H., Melskens, Jimmy, Macco, Bart, Theeuwes, Roel J., Verheijen, Marcel A., Kessels, Wilhelmus M. M.

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  2. 2
    Excellent passivation of germanium surfaces by POx/Al2O3 stacks

    Excellent passivation of germanium surfaces by POx/Al2O3 stacks by Theeuwes, Roel J., Berghuis, Wilhelmus J. H., Macco, Bart, Kessels, Wilhelmus M. M.

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  3. 3
    Excellent surface passivation of germanium by a-Si:H/Al2O3 stacks

    Excellent surface passivation of germanium by a-Si:H/Al2O3 stacks by Berghuis, Wilhelmus J. H. (Willem-Jan), Melskens, Jimmy, Macco, Bart, Theeuwes, Roel J., Black, Lachlan E., Verheijen, Marcel A., Kessels, Wilhelmus M. M. (Erwin)

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  4. 4
    POx/Al2O3 stacks for surface passivation of Si and InP

    POx/Al2O3 stacks for surface passivation of Si and InP by Theeuwes, Roel J., Melskens, Jimmy, Beyer, Wolfhard, Breuer, Uwe, Black, Lachlan E., Berghuis, Wilhelmus J.H., Macco, Bart, Kessels, Wilhelmus M.M.

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  5. 5
    Extracting surface recombination parameters of germanium–dielectric interfaces by corona-lifetime experiments

    Extracting surface recombination parameters of germanium–dielectric interfaces by corona-lifetime experiments by Berghuis, Wilhelmus J. H. (Willem-Jan), Helmes, Max, Melskens, Jimmy, Theeuwes, Roel J., Kessels, Wilhelmus M. M. (Erwin), Macco, Bart

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  6. 6
    Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells

    Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells by Macco, Bart, van de Poll, Mike L., van de Loo, Bas W.H., Broekema, Tim M.P., Basuvalingam, Saravana B., van Helvoirt, Cristian A.A., Berghuis, Wilhelmus J.H., Theeuwes, Roel J., Phung, Nga, Kessels, Wilhelmus M.M.

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  7. 7
    Atomic layer deposition of Nb-doped TiO2: Dopant incorporation and effect of annealing

    Atomic layer deposition of Nb-doped TiO2: Dopant incorporation and effect of annealing by Berghuis, Wilhelmus J. H. (Willem-Jan), Melskens, Jimmy, Macco, Bart, Basuvalingam, Saravana Balaji, Verheijen, Marcel A., Kessels, Wilhelmus M. M. (Erwin)

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