Fluidized-bed atomic layer deposition reactor for the synthesis of core-shell nanoparticles by Didden, Arjen P., Middelkoop, Joost, Besling, Wim F. A., Nanu, Diana E., van de Krol, Roel

Get full text

Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy by Puurunen, Riikka L., Vandervorst, Wilfried, Besling, Wim F. A., Richard, Olivier, Bender, Hugo, Conard, Thierry, Zhao, Chao, Delabie, Annelies, Caymax, Matty, De Gendt, Stefan, Heyns, Marc, Viitanen, Minna M., de Ridder, Marco, Brongersma, Hidde H., Tamminga, Yde, Dao, Thuy, de Win, Toon, Verheijen, Marcel, Kaiser, Monja, Tuominen, Marko

Get full text

Copper alloy seed integration for reliability improvement by Besling, Wim F.A., Federspiel, X., Vanypre, T., Torres, Joaquin

Get full text

Continuity and morphology of TaN barriers deposited by Atomic Layer Deposition and comparison with physical vapor deposition by Besling, Wim F.A., Ignacimouttou, Marie-Laurence, Humbert, Aurelie, Mellier, Maxime, Torres, Joaquin

Get full text

RF Characterization and Analytical Modelling of Through Silicon Vias and Coplanar Waveguides for 3D Integration by Lamy, Y P R, Jinesh, K B, Roozeboom, F, Gravesteijn, D J, Besling, W F A

Get full text

Dielectric Material Options for Integrated Capacitors by Ruhl, Guenther, Lehnert, Wolfgang, Lukosius, Mindaugas, Wenger, Christian, Baristiran Kaynak, Canan, Blomberg, Tom, Haukka, Suvi, Baumann, Peter K., Besling, Wim, Roest, Aarnoud, Riou, Benoit, Lhostis, Sandrine, Halimaou, Aomar, Roozeboom, Fred, Langereis, Erik, Kessels, W. M. M., Zauner, Andy, Rushworth, Simon

Get full text

Development of sub-10-nm atomic layer deposition barriers for Cu/low- k interconnects by Beyer, Gerald, Satta, Alessandra, Schuhmacher, Jörg, Maex, Karen, Besling, Wim, Kilpela, Olli, Sprey, Hessel, Tempel, Georg

Get full text