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Inductively coupled plasma etch damage in (-201) Ga2O3 Schottky diodes
by
Yang, Jiancheng
,
Ahn, Shihyun
,
Ren, F.
,
Khanna, Rohit
,
Bevlin, Kristen
,
Geerpuram, Dwarakanath
,
Pearton, S. J.
,
Kuramata, A.
Published in
Applied physics letters
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Annealing of dry etch damage in metallized and bare (-201) Ga2O3
by
Yang, Jiancheng
,
Ren, Fan
,
Khanna, Rohit
,
Bevlin, Kristen
,
Geerpuram, Dwarakanath
,
Tung, Li-Chun
,
Lin, Jingyu
,
Jiang, Hongxing
,
Lee, Jonathan
,
Flitsiyan, Elena
,
Chernyak, Leonid
,
Pearton, S. J.
,
Kuramata, Akito
Published in
Journal of vacuum science and technology. B, Nanotechnology & microelectronics
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Inductively coupled plasma etching of bulk, single-crystal Ga2O3
by
Yang, Jiancheng
,
Ahn, Shihyun
,
Ren, Fan
,
Pearton, Stephen
,
Khanna, Rohit
,
Bevlin, Kristen
,
Geerpuram, Dwarakanath
,
Kuramata, Akito
Published in
Journal of vacuum science and technology. B, Nanotechnology & microelectronics
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Journal Of Vacuum Science And Technology. B, Nanotechnology & Microelectronics
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Applied Physics Letters
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Journal Of Vacuum Science & Technology B, Nanotechnology And Microelectronics: Materials, Processing, Measurement, And Phenomena
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Applied Physics
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Barriers
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Boron Chlorides
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Damage
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Electric Potential
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Gallium Oxides
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Inductively Coupled Plasma
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Ion Energy Distribution
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American Institute Of Physics:jisc Collections:transitional Journals Agreement 2021-23 (Reading List)
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American Institute Of Physics
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