RESIST DESIGN CONSIDERATIONS FOR DIRECT WRITE AND PROJECTION ELECTRON-BEAM LITHOGRAPHY TECHNOLOGIES by Novembre, Anthony E., Tarascon, Regine G., Berger, Steven D., Biddick, Chris J., Blakey, Myrtle I., Bolan, Kevin J., Fetter, Linus A., Harriott, Lloyd R., Huggins, Harold A., Knurek, Chester S., Liddle, J. Alexander, Mixon, David A., Peabody, Milton L.

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The SCattering with Angular Limitation in Projection Electron-beam Lithography (SCALPEL) system by LIDDLE, J. A, BERGER, S. D, CUSTY, J, FARROW, R. C, FELKER, J. A, FETTER, L. A, FREEMAN, B, HARRIOTT, L. R, HOPKINS, L.L, HUGGINS, H. A, KNUREK, C. S, KRAUS, J. S, BIDDICK, C. J, MIXON, D. A, MKRTCHYAN, M. M, NOVEMBRE, A. E, PEABODY, M. L, SIMPSON, W. M, TARASCON, R. G, WADE, H. H, WASKIEWICZ, W. K, WATSON, G. P, WILLIAMS, J. K, BLAKEY, M. I, WINDT, D. L, BOLAN, BOWLER, S. W, BRADY, K, CAMARDA, R. M, CONNELLY, W. F, CHORKEN, A

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