Search Results - Blake, T.G.W.

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  1. 1
    A flexible gate array architecture for high-speed and high-density applications

    A flexible gate array architecture for high-speed and high-density applications by Gallia, J.D., Landers, R.J., Shaw, C.-H., Blake, T.G.W., Banzhaf, W.

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    Titanium nitride local interconnect technology for VLSI

    Titanium nitride local interconnect technology for VLSI by Tang, T.E., Che-Chia Wei, Haken, R.A., Holloway, T.C., Hite, L.R., Blake, T.G.W.

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    IIB-1 1.25-µm buried-oxide SOI/CMOS process for 16K/64K SRAMS

    IIB-1 1.25-µm buried-oxide SOI/CMOS process for 16K/64K SRAMS by Chen, C.-E., Matloubian, M., Mao, B.-Y., Sundaresan, R., Slawinski, C., Lam, H.W., Blake, T.G.W., Hite, L.R., Hester, R.K.

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    Processing and transistor characteristics of a 256 K SRAM fabricated on SIMOX

    Processing and transistor characteristics of a 256 K SRAM fabricated on SIMOX by Bailey, W.E., Lu, H., Blake, T.G.W., Hite, L.R., Mei, P., Hurta, D., Houston, T.W., Pollack, G.P.

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