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RESIST DESIGN CONSIDERATIONS FOR DIRECT WRITE AND PROJECTION ELECTRON-BEAM LITHOGRAPHY TECHNOLOGIES
by
Novembre, Anthony E.
,
Tarascon, Regine G.
,
Berger, Steven D.
,
Biddick, Chris J.
,
Blakey, Myrtle I.
,
Bolan, Kevin J.
,
Fetter, Linus A.
,
Harriott, Lloyd R.
,
Huggins, Harold A.
,
Knurek, Chester S.
,
Liddle, J. Alexander
,
Mixon, David A.
,
Peabody, Milton L.
Published in
Journal of Photopolymer Science and Technology
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Terahertz electroluminescence from superlattice quantum cascade structures
by
Colombelli, Raffaele
,
Straub, Axel
,
Capasso, Federico
,
Gmachl, Claire
,
Blakey, Myrtle I.
,
Sergent, A. Michael
,
Chu, S. N. George
,
West, Ken W.
,
Pfeiffer, Loren N.
Published in
Journal of applied physics
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New Developments in Resist Materials for the SCALPEL Technology
by
Novembre, Anthony E.
,
Ocola, Leonidas E.
,
Houlihan, Frank
,
Knurek, Chester
,
Blakey, Myrtle
Published in
Journal of Photopolymer Science and Technology
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