Multistep profiles by mix and match of nanoimprint and UV lithography by Pfeiffer, K., Fink, M., Gruetzner, G., Bleidiessel, G., Schulz, H., Scheer, H.

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Nanoimprint lithography: an alternative nanofabrication approach by Sotomayor Torres, C.M., Zankovych, S., Seekamp, J., Kam, A.P., Clavijo Cedeño, C., Hoffmann, T., Ahopelto, J., Reuther, F., Pfeiffer, K., Bleidiessel, G., Gruetzner, G., Maximov, M.V., Heidari, B.

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Novel linear and crosslinking polymers for nanoimprinting with high etch resistance by Pfeiffer, K., Fink, M., Bleidiessel, G., Gruetzner, G., Schulz, H., Scheer, H.-C., Hoffmann, T., Sotomayor Torres, C.M., Gaboriau, F., Cardinaud, Ch

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High density fluorocarbon plasma etching of new resists suitable for nano-imprint lithography by Gaboriau, F., Peignon, M.C., Barreau, A., Turban, G., Cardinaud, Ch, Pfeiffer, K., Bleidießel, G., Grützner, G.

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Suitability of new polymer materials with adjustable glass temperature for nano-imprinting by Pfeiffer, K., Bleidiessel, G., Gruetzner, G., Schulz, H., Hoffmann, T., Scheer, H.-C., Sotomayor Torres, C.M., Ahopelto, J.

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Dependence of the quality of thick resist structures on resist baking by Bleidiessel, G., Gruetzner, G., Reuther, F., Fehlberg, S., Loechel, B., Maciossek, A.

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New polymer materials for nanoimprinting by Schulz, H., Scheer, H.-C., Hoffmann, T., Sotomayor Torres, C. M., Pfeiffer, K., Bleidiessel, G., Grützner, G., Cardinaud, Ch, Gaboriau, F., Peignon, M.-C., Ahopelto, J., Heidari, B.

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Master replication into thermosetting polymers for nanoimprinting by Schulz, H., Lyebyedyev, D., Scheer, H.-C., Pfeiffer, K., Bleidiessel, G., Grützner, G., Ahopelto, J.

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Suitability of new polymer materials with adjustable glass temperature for nanoimprinting by PFEIFFER, K, BLEIDIESSEL, G, GRUETZNER, G, SCHULZ, H, HOFFMANN, T, SCHEER, H.-C, SOTOMAYOR TORRES, C. M, AHOPELTO, J

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