Improving etch selectivity and stability of novolak based negative resists by fluorine plasma treatment by Blideran, M.M., Häffner, M., Schuster, B.-E., Raisch, C., Weigand, H., Fleischer, M., Peisert, H., Chassé, T., Kern, D.P.

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Characterization of the morphology and composition of commercial negative resists used for lithographic processes by Schuster, B.-E, Haug, A, Häffner, M, Blideran, M. M, Fleischer, M, Peisert, H, Kern, D. P, Chassé, T

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Real-time gripping detection for a mechanically actuated microgripper by Blideran, M.M., Fleischer, M., Grauvogel, F., Löffler, K., Langer, M.G., Kern, D.P.

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A mechanically actuated silicon microgripper for handling micro- and nanoparticles by Blideran, Marius M., Bertsche, Günter, Henschel, Wolfgang, Kern, Dieter P.

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Microcolumn with variable axis lens for large scan fields and pixel numbers by Weigand, H., Gautsch, S., Strohmaier, W., Blideran, M., Staufer, U., de Rooij, N.F., Kern, D.P.

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Giant magneto-resistive granular layers deposited by TVA method by Mustata, I., Lungu, C.P., Lungu, A.M., Zaroski, V., Blideran, M., Ciupina, V.

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Nanostructured Carbon Thin Films Deposition Using Thermionic Vacuum Arc (TVA) Technology by Musa, G, Mustata, I, Blideran, M, Ciupina, V, Vladoiu, R, Prodan, G, Vasile, E

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Ag-DLC Tribological Film Deposition by Double Thermionic Vacuum Arc by Mustata, I, Musa, G, Blideran, M, Zaroschi, V, Lungu, A M

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Characterization and operation of a mechanically actuated silicon microgripper by Blideran, Marius M., Fleischer, Monika, Henschel, Wolfgang, Kern, Dieter P., Sterr, Jochen, Schock, Klaus, Kleindiek, Stephan, Langer, Matthias G., Löffler, Karsten, Grauvogel, Francois

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