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    Formation of W/Hf[O.sub.2]/Si gate structures using in situ magnetron sputtering and rapid thermal annealing

    Formation of W/Hf[O.sub.2]/Si gate structures using in situ magnetron sputtering and rapid thermal annealing by Bogoyavlenskaya, E.A, Rudakov, V.I, Denisenko, Yu. I, Naumov, V.V, Rogozhin, A.E

    Published in Technical physics
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