Search Results - Bolbot, P.H.

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  1. 1
    Optimization of oxygen-implanted silicon substrates for CMOS devices by electrical characterization

    Optimization of oxygen-implanted silicon substrates for CMOS devices by electrical characterization by Foster, D.J., Butler, A.L., Bolbot, P.H., Alderman, J.C.

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  2. 2
    IIB-5 sidewall parasitic suppression in trench-isolated submicrometer CMOS

    IIB-5 sidewall parasitic suppression in trench-isolated submicrometer CMOS by Foster, D.J., Roberts, M.C., Bolbot, P.H., Medhurst, P.L.

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  3. 3
    A Sub-Micron CMOS Process Employing Trench Isolation

    A Sub-Micron CMOS Process Employing Trench Isolation by Roberts, M.C., Bolbot, P.H., Foster, D.J.

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  4. 4
    A Comparison of Trench Filling Materials for Sub-Micron CMOS

    A Comparison of Trench Filling Materials for Sub-Micron CMOS by Bolbot, P.H., Roberts, M.C., Medhurst, P.L.

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