Search Results - Bosund, V

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  1. 1
    Nonlinear fitness–space–structure adaptation and principal component analysis in genetic algorithms: an application to x-ray reflectivity analysis

    Nonlinear fitness–space–structure adaptation and principal component analysis in genetic algorithms: an application to x-ray reflectivity analysis by Tiilikainen, J, Tilli, J-M, Bosund, V, Mattila, M, Hakkarainen, T, Airaksinen, V-M, Lipsanen, H

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  2. 2
    Genetic algorithm using independent component analysis in x-ray reflectivity curve fitting of periodic layer structures

    Genetic algorithm using independent component analysis in x-ray reflectivity curve fitting of periodic layer structures by Tiilikainen, J, Bosund, V, Tilli, J-M, Sormunen, J, Mattila, M, Hakkarainen, T, Lipsanen, H

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  3. 3
    Fitness function and nonunique solutions in x-ray reflectivity curve fitting: crosserror between surface roughness and mass density

    Fitness function and nonunique solutions in x-ray reflectivity curve fitting: crosserror between surface roughness and mass density by Tiilikainen, J, Bosund, V, Mattila, M, Hakkarainen, T, Sormunen, J, Lipsanen, H

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  4. 4
    Accuracy in x-ray reflectivity analysis

    Accuracy in x-ray reflectivity analysis by Tiilikainen, J, Tilli, J-M, Bosund, V, Mattila, M, Hakkarainen, T, Sormunen, J, Lipsanen, H

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  5. 5
    GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride

    GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride by Bosund, M., Mattila, P., Aierken, A., Hakkarainen, T., Koskenvaara, H., Sopanen, M., Airaksinen, V.-M., Lipsanen, H.

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  6. 6
    Erratum to “GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride” [Appl. Surf. Sci. 256 (2010) 7434–7437]

    Erratum to “GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride” [Appl. Surf. Sci. 256 (2010) 7434–7437] by Bosund, M., Mattila, P., Aierken, A., Hakkarainen, T., Koskenvaara, H., Sopanen, M., Airaksinen, V.-M., Lipsanen, H.

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  7. 7
    ATOMIC LAYER DEPOSITION HfO sub(2) FILM USED AS BUFFER LAYER OF THE Pt/(Bi sub(0.95)Nd sub(0.05)) (Fe sub(0.95) Mn sub(0.05))O sub(3)/HfO sub(2)/Si CAPACITORS FOR FeFET APPLICATION

    ATOMIC LAYER DEPOSITION HfO sub(2) FILM USED AS BUFFER LAYER OF THE Pt/(Bi sub(0.95)Nd sub(0.05)) (Fe sub(0.95) Mn sub(0.05))O sub(3)/HfO sub(2)/Si CAPACITORS FOR FeFET APPLICATION by Xie, D, Feng, T, Luo, Y, Han, X, Ren, T, Bosund, M, Li, S, Airaksinen, V-M, Lipsanen, H, Honkanen, S

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