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Search Results - Botzakaki, M.A.
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ALD deposited ZrO2 ultrathin layers on Si and Ge substrates: A multiple technique characterization
by
Botzakaki, M.A.
,
Xanthopoulos, N.
,
Makarona, E.
,
Tsamis, C.
,
Kennou, S.
,
Ladas, S.
,
Georga, S.N.
,
Krontiras, C.A.
Published in
Microelectronic engineering
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Si nanowire-based micro-capacitors fabricated with metal assisted chemical etching for integrated energy storage applications
by
Hourdakis, E.
,
Kochylas, I.
,
Botzakaki, M.A.
,
Xanthopoulos, N.J.
,
Gardelis, S.
Published in
Solid-state electronics
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Controllable growth of stable germanium dioxide ultra-thin layer by means of capacitively driven radio frequency discharge
by
Svarnas, P.
,
Botzakaki, M.A.
,
Skoulatakis, G.
,
Kennou, S.
,
Ladas, S.
,
Tsamis, C.
,
Georga, S.N.
,
Krontiras, C.A.
Published in
Thin solid films
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