Search Results - Brugnara, Ricardo Henrique

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    Continuum and kinetic simulations of the neutral gas flow in an industrial physical vapor deposition reactor

    Continuum and kinetic simulations of the neutral gas flow in an industrial physical vapor deposition reactor by Bobzin, Kirsten, Brinkmann, Ralf Peter, Mussenbrock, Thomas, Bagcivan, Nazlim, Brugnara, Ricardo Henrique, Schäfer, Marcel, Trieschmann, Jan

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    Influence of Ar/Kr ratio and pulse parameters in a Cr-N high power pulse magnetron sputtering process on plasma and coating properties

    Influence of Ar/Kr ratio and pulse parameters in a Cr-N high power pulse magnetron sputtering process on plasma and coating properties by Bobzin, Kirsten, Bagcivan, Nazlim, Theiß, Sebastian, Trieschmann, Jan, Brugnara, Ricardo Henrique, Preissing, Sven, Hecimovic, Ante

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  3. 3
    Continuum and Kinetic Simulations of the Neutral Gas Flow in an Industrial Physical Vapor Deposition Reactor

    Continuum and Kinetic Simulations of the Neutral Gas Flow in an Industrial Physical Vapor Deposition Reactor by Bobzin, Kirsten, Brinkmann, Ralf Peter, Mussenbrock, Thomas, Bagcivan, Nazlim, Brugnara, Ricardo Henrique, Schäfer, Marcel, Trieschmann, Jan

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