Search Results - CLEVENGER, Larry
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A study of BEOL resistance mismatch in double patterning process
Conference Proceeding -
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A novel analytical capacitance model for sub-10 nm interconnects
Conference Proceeding -
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Dual damascene aluminum for 1-Gbit DRAMs, part 3
Published in Solid state technologyGet full text
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Management Challenges in Park and Recreation Agencies
Published in Parks & recreation (Arlington, Va.)Get full text
Magazinearticle