Search Results - Carbaugh, Daniel J.

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  1. 1
    A review of polymethyl methacrylate (PMMA) as a versatile lithographic resist – With emphasis on UV exposure

    A review of polymethyl methacrylate (PMMA) as a versatile lithographic resist – With emphasis on UV exposure by Rahman, Faiz, Carbaugh, Daniel J., Wright, Jason T., Rajan, Parthiban, Pandya, Sneha G., Kaya, Savas

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  2. 2
    Photolithography with polymethyl methacrylate (PMMA)

    Photolithography with polymethyl methacrylate (PMMA) by Carbaugh, Daniel J, Wright, Jason T, Parthiban, Rajan, Rahman, Faiz

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  3. 3
    Negative tone photolithography with photo-sensitised polymethyl methacrylate (PMMA)

    Negative tone photolithography with photo-sensitised polymethyl methacrylate (PMMA) by Carbaugh, Daniel J., Wright, Jason T., Rahman, Faiz

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  4. 4
    Combination photo and electron beam lithography with polymethyl methacrylate (PMMA) resist

    Combination photo and electron beam lithography with polymethyl methacrylate (PMMA) resist by Carbaugh, Daniel J, Pandya, Sneha G, Wright, Jason T, Kaya, Savas, Rahman, Faiz

    Published in Nanotechnology
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  5. 5
    Dry photolithography through ultraviolet radiation-induced photo-etching of polymethyl methacrylate

    Dry photolithography through ultraviolet radiation-induced photo-etching of polymethyl methacrylate by Carbaugh, Daniel J., Wright, Jason T., Rajan, Parthiban, Kaya, Savas, Rahman, Faiz

    Published in Thin solid films
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  6. 6
    Lithographic tone reversal in optical exposure of polymethyl methacrylate (PMMA) resist

    Lithographic tone reversal in optical exposure of polymethyl methacrylate (PMMA) resist by Carbaugh, Daniel J, Kaya, Savas, Rahman, Faiz

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  7. 7
    Thermal oxidation of silicon in a residual oxygen atmosphere-the RESOX process-for self-limiting growth of thin silicon dioxide films

    Thermal oxidation of silicon in a residual oxygen atmosphere-the RESOX process-for self-limiting growth of thin silicon dioxide films by Wright, Jason T, Carbaugh, Daniel J, Haggerty, Morgan E, Richard, Andrea L, Ingram, David C, Kaya, Savas, Jadwisienczak, Wojciech M, Rahman, Faiz

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  8. 8
    Transparent and visible light-insensitive acrylic photoresist for negative tone optical lithography

    Transparent and visible light-insensitive acrylic photoresist for negative tone optical lithography by Carbaugh, Daniel J., Kaya, Savas, Rahman, Faiz

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  9. 9
    Enhancing the dry etch resistance of polymethyl methacrylate patterned with electron beam lithography

    Enhancing the dry etch resistance of polymethyl methacrylate patterned with electron beam lithography by Carbaugh, Daniel J., Pandya, Sneha G., Wright, Jason T., Kaya, Savas, Rahman, Faiz

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  10. 10
    Development-less deep ultraviolet positive tone photolithography with polymethyl methacrylate

    Development-less deep ultraviolet positive tone photolithography with polymethyl methacrylate by Carbaugh, Daniel J., Wright, Jason T., Rajan, Parthiban, Kaya, Savas, Rahman, Faiz

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  11. 11
    Plerixafor for pathogen‐agnostic treatment in murine thigh infection and zebrafish sepsis

    Plerixafor for pathogen‐agnostic treatment in murine thigh infection and zebrafish sepsis by Evans, Martin O., Smith, Darren M., Kress, Adrian T., Nadeau, Robert J., Selig, Daniel J., Caridha, Diana, Racharaks, Ratanachat, Langowski, Thomas, Madejczyk, Michael S., Carbaugh, Chance, Saunders, David, Widder, Mark, De Meese, Jason, Lee, Patricia J., DeLuca, Jesse P.

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  12. 12
    A factorial analysis of input parameters using finite element techniques

    A factorial analysis of input parameters using finite element techniques by CARBAUGH, D. F, FRATER, J. L

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