CMOS image sensor: Process impact on dark current by Carrere, J.-P, Place, S., Oddou, J.-P, Benoit, D., Roy, F.

Request full text

New mechanism of plasma induced damage on CMOS image sensor: Analysis and process optimization by Carrère, J.P., Oddou, J.P., Place, S., Richard, C., Benoit, D., Jenny, C., Gatefait, M., Aumont, C., Tournier, A., Roy, F.

Get full text

New circuit model for investigating plasma damage in FDSOI devices by Akbal, M., Ribes, G., Poiroux, T., Carrere, J.-P, Vallier, L.

Request full text

Multigate MOSFET in a Bulk Technology by Integrating Polysilicon-Filled Trenches by Ramadout, B., Guo-Neng Lu, Carrere, J.-P., Pinzelli, L., Perrot, C., Rivoire, M., Nemouchi, F.

Get full text

Plasma Antenna Charging in CMOS Image Sensors by Sacchettini, Y., Carrere, J. -P., Goiffon, V., Magnan, P.

Request full text

A Highly Reliable Back Side Illuminated Pixel against Plasma Induced Damage by Sacchettini, Y., Carrere, J.-P., Doyen, C., Duru, R., Courouble, K., Ricq, S., Goiffon, V., Magnan, P.

Request full text

CMOS gate oxide defects induced by pre-gate plasma process by Carrère, J-P., Garnier, P., Desvoivres, L., Berthoud, A., Lunenborg, M.

Get full text

Rad Tolerant CMOS Image Sensor Based on Hole Collection 4T Pixel Pinned Photodiode by Place, S., Carrere, J-P, Allegret, S., Magnan, P., Goiffon, V., Roy, F.

Get full text

Validated 90nm CMOS technology platform with low-k copper interconnects for advanced system-on-chip (SoC) by Devoivre, T., Lunenborg, M., Julien, C., Carrere, J.-P., Ferreira, P., Toren, W.J., VandeGoor, A., Gayet, P., Berger, T., Hinsinger, O., Vannier, P., Trouiller, Y., Rody, Y., Goirand, P.-J., Palla, R., Thomas, I., Guyader, F., Roy, D., Borot, B., Planes, N., Naudet, S., Pico, F., Duca, D., Lalanne, F., Heslinga, D., Haond, M.

Request full text

Embedded FLASH memory thermal budget impact on core CMOS 90nm devices by Carrere, J.-P., Larman, F., van der Vegt, E., Bocat, M., Auriac, N., Cherault, N., Charleux, M., Rochereau, K., Hopstaken, M., Pantel, R., Boter, D., Dormans, D.

Request full text

Radiation Effects on CMOS Image Sensors With Sub-2 [Formula Omitted] Pinned Photodiodes by Place, S, Carrere, J.-P, Allegret, S, Magnan, P, Goiffon, V, Roy, F

Get full text

Radiation Effects on CMOS Image Sensors With Sub-2 mu rm m Pinned Photodiodes by Place, S, Carrere, J-P, Allegret, S, Magnan, P, Goiffon, V, Roy, F

Get full text

Radiation Effects on CMOS Image Sensors With Sub-2 \mu Pinned Photodiodes by Place, S., Carrere, J.-P., Allegret, S., Magnan, P., Goiffon, V., Roy, F.

Get full text

MOS Capacitor Deep Trench Isolation for CMOS image sensors by Ahmed, N., Roy, F., Lu, G.-N, Mamdy, B., Carrere, J.-P, Tournier, A., Virollet, N., Perrot, C., Rivoire, M., Seignard, A., Pellissier-Tanon, D., Leverd, F., Orlando, B.

Request full text

Thermal Nitridation of Chemical Dielectrics as an Easy Approach to Ultra-thin Gate Oxide Processing by Bidaud, M., Carrere, J.P., Guyader, F., Juhel, M., Pantel, R.

Request full text

Ultra-Thin Gate Oxide (1.6 nm): New Mechanisms of Plasma Induced Damage and Oxidation Process Optimisation by Carrere, J.-P., Bidaud, M., Guyader, F., Haond, M.

Request full text

Triple Gate Oxide by nitrogen implantation integrated in a 0.13μm CMOS flow by CARRERE, J-P, GROUILLET, A, GUYADER, F, BEVERINA, A, BIDAUD, M, HALIMAOUI, A

Get full text

Silicon clean impact on 90nm CMOS devices performance by Carrere, J.-P., Bernard, H., Petitdidier, S., Beverina, A., Rosa, J., Guyader, F.

Request full text

Charging protection and degradation by antenna environment on NMOS and PMOS transistors by Carrere, J.-P., Heslinga, D.R.

Request full text

New mechanism of plasma induced damage on CMOS image sensor: Analysis and process optimization by Carrere, J.P., Oddou, J.P., Richard, C., Jenny, C., Gatefait, M., Place, S., Aumont, C., Tournier, A., Roy, F.

Request full text