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Boron doping of silicon by plasma source ion implantation
by
Matyi, R.J.
,
Chapek, D.L.
,
Brunco, D.P.
,
Felch, S.B.
,
Lee, B.S.
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Surface & coatings technology
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Plasma Doped (PLAD) Deep Sub-Half Micron Buried Channel PMOSFETS and its Application to Next Generation ULSI Circuits
by
Ahmad, A.
,
Prall, K.
,
Chapek, D.L.
,
Thakur, R.P.S.
,
Felch, S.B.
,
Brunco, D.P.
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Formation of deep sub-micron buried channel pMOSFETs with plasma doping
by
Felch, S.B.
,
Brunco, D.P.
,
Lee, B.S.
,
Ahmad, A.
,
Prall, K.
,
Chapek, D.L.
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Surface & Coatings Technology
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Boron
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Doping
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Ion Implantation
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Mosfets
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Plasma Immersion Ion Implantation
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Plasma Sources
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Acceleration
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Circuits
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Condensed Matter: Structure, Mechanical And Thermal Properties
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Defects And Impurities In Crystals; Microstructure
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Doping And Impurity Implantation In Germanium And Silicon
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Exact Sciences And Technology
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Implants
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Materials Science
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Materials Science, Coatings & Films
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Physical Sciences
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Physics
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Physics, Applied
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Plasma Accelerators
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Plasma Applications
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Ieee Electronic Library (Iel) Conference Proceedings
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Ieee Xplore All Conference Series
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Elsevier Sciencedirect Journals
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Backfile Package - Materials Science [Yms]
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Backfile Package - Physics General (Legacy) [Ypa]
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