Search Results - Chapple-Sokol, J. D

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  1. 1
    Polarization Effects of Fluorine on the Relative Permittivity in Polyimides

    Polarization Effects of Fluorine on the Relative Permittivity in Polyimides by Hougham, G, Tesoro, G, Viehbeck, A, Chapple-Sokol, J. D

    Published in Macromolecules
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  2. 2
    Energy considerations in the deposition of high-quality plasma-enhanced CVD silicon dioxide

    Energy considerations in the deposition of high-quality plasma-enhanced CVD silicon dioxide by CHAPPLE-SOKOL, J. D, PLISKIN, W. A, CONTI, R. A, TIERNEY, E, BATEY, J

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  3. 3
    Plasma-enhanced chemical vapor deposition of silicon dioxide films using tetraethoxysilane and oxygen : characterization and properties of films

    Plasma-enhanced chemical vapor deposition of silicon dioxide films using tetraethoxysilane and oxygen : characterization and properties of films by PATRICK, W. J, COGIN SCHWARTZ, G, CHAPPLE-SOKOL, J. D, CARRUTHERS, R, OLSEN, K

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  4. 4
    Kinetic modeling of the chemical vapor deposition of silicon dioxide from silane or disilane and nitrous oxide

    Kinetic modeling of the chemical vapor deposition of silicon dioxide from silane or disilane and nitrous oxide by GIUNTA, C. J, CHAPPLE-SOKOL, J. D, GORDON, R. G

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  5. 5
    A kinetics study of the atmospheric pressure CVD reaction of silane and nitrous oxide

    A kinetics study of the atmospheric pressure CVD reaction of silane and nitrous oxide by CHAPPLE-SOKOL, J. D, GIUNTA, C. J, GORDON, R. G

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  6. 6
    Substrate-dependent growth of atmospheric pressure chemically vapor deposited silicon dioxide from dichlorosilane and oxygen

    Substrate-dependent growth of atmospheric pressure chemically vapor deposited silicon dioxide from dichlorosilane and oxygen by Chapple-Sokol, Jonathan D., Gordon, Roy G.

    Published in Thin solid films
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  7. 7
    Gas-phase kinetics in the atmospheric pressure chemical vapor deposition of silicon from silane and disilane

    Gas-phase kinetics in the atmospheric pressure chemical vapor deposition of silicon from silane and disilane by Giunta, Carmen J., McCurdy, Richard J., Chapple-Sokol, Jonathan D., Gordon, Roy G.

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  8. 8
    Etching of copper in deionized water rinse

    Etching of copper in deionized water rinse by Gambino, J., Wenner, M, McDevitt, T., Chapple-Sokol, J., Luce, S., Robbins, J., Rutkowski, T., Johnson, C., DeVries, K., Rath, D., Vereecken, P., Walton, E., Porth, B.

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