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Evolution of porous surfaces Si[111] and Si[100] during annealing and epitaxy processes (simulation)
by
Chemakin, A.V.
,
Shwartz, N.L.
,
Yanovitskaja, Z.S.
,
Zverev, A.V.
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Atomic Layer Deposition
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Epitaxial Growth
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Physics
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Semiconductor Process Modeling
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Silicon On Insulator Technology
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Simulated Annealing
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Smoothing Methods
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Solids
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Substrates
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Temperature
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Ieee Electronic Library (Iel) Conference Proceedings
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