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Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
by
Vincent, Benjamin
,
Hathwar, Raghu
,
Kamon, Mattan
,
Ervin, Joseph
,
Schram, Tom
,
Chiarella, Thomas
,
Demuynck, Steven
,
Baudot, Sylvain
,
Siew, Yong Kong
,
Kubicek, Stenfan
,
Litta, Eugenio Dentoni
,
Chew, SoonAik
,
Mitard, Jerome
Published in
IEEE transactions on electron devices
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Ieee Transactions On Electron Devices
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14-Nm Fin Field Effect Transistor
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Annealing
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Calibration
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Cmos
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Design Of Experiments
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Engineering, Electrical & Electronic
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Field Effect Transistors
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Finfets
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High Temperature
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Logic Gates
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