Search Results - Chiew-seng Koay

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  1. 1
    Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas

    Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas by GEORGE, Simi A, SILFVAST, William T, TAKENOSHITA, Kazutoshi, BERNATH, Robert T, KOAY, Chiew-Seng, SHIMKAVEG, Gregory, RICHARDSON, Martin C

    Published in Optics letters
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  2. 2
    Pathway to sub-30nm Resolution in EUV Lithography

    Pathway to sub-30nm Resolution in EUV Lithography by Thakerlay, James W., Nassar, Roger A., Spear-Alfonso, Kathleen, Brainard, Robert, Goldfarb, Dario, Wallow, Thomas, Wei, Yayi, Montgomery, Warren, Petrillo, Karen, Wood, Robert, Koay, Chief-seng, Mackey, Jeff, Naulleau, Patrick, Pierson, Bill, Solak, Harun H.

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  3. 3
    Enhanced process control of pitch split double patterning by use of CD-SEM critical dimension uniformity and local overlay metrics

    Enhanced process control of pitch split double patterning by use of CD-SEM critical dimension uniformity and local overlay metrics by Halle, S. D., Hotta, S., Koay, C., Chen, S., Kato, T., Yamaguchi, A., Colburn, M.

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  4. 4
    Optimization of pitch-split double patterning phoresist for applications at the 16nm node

    Optimization of pitch-split double patterning phoresist for applications at the 16nm node by Holmes, S. J., Tang, C., Burns, S., Yunpeng Yin, Chen, R., Chiew-seng Koay, Kini, S., Tomizawa, H., Shyng-Tsong Chen, Fender, N., Osborn, B., Singh, L., Petrillo, K., Landie, G., Halle, S., Sen Liu, Arnold, J. C., Spooner, T., Varanasi, R., Slezak, M., Colburn, M., Dunn, S., Hetzer, D., Kawakami, S., Cantone, J.

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  5. 5
    48nm Pitch cu dual-damascene interconnects using self aligned double patterning scheme

    48nm Pitch cu dual-damascene interconnects using self aligned double patterning scheme by Shyng-Tsong Chen, Tae-Soo Kim, Seo-woo Nam, Lafferty, Neal, Chiew-Seng Koay, Saulnier, Nicole, Wenhui Wang, Yongan Xu, Duclaux, Benjamin, Mignot, Yann, Beard, Marcy, Yunpeng Yin, Shobha, Hosadurga, Van der Straten, Oscar, Ming He, Kelly, James, Colburn, Matthew, Spooner, Terry

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  6. 6
    56 nm pitch copper dual-damascene interconnects with triple pitch split metal and double pitch split via

    56 nm pitch copper dual-damascene interconnects with triple pitch split metal and double pitch split via by Chen, J. H.-C, Waskiewicz, C., Fan, S. S.-C, Halle, S., Chiew-seng Koay, Yongan Xu, Saulnier, N., Chia-Hsun Tseng, Yunpeng Yin, Mignot, Y., Beard, M., Morris, B., Horak, D., Mignot, S., Shobha, H., Sankarapandian, M., van der Straten, O., Kelly, J. J., Canaperi, D., Mclellan, E., Boye, C., Levin, T., Juntao Li, Demarest, J., Choi, S., Huang, E., Liemann, L., Haran, B., Arnold, J. C., Colburn, M., Clevenger, L., Spooner, T.

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  7. 7
    Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas

    Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas by George, Simi A, Silfvast, William T, Takenoshita, Kazutoshi, Bernath, Robert T, Koay, Chiew-Seng, Shimkaveg, Gregory, Richardson, Martin C

    Published in Optics letters
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