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    Surface reaction during thermal atomic layer etching of aluminum oxide films using fluorine radicals and trimethylaluminum

    Surface reaction during thermal atomic layer etching of aluminum oxide films using fluorine radicals and trimethylaluminum by Kim, Yewon, Kim, Okhyeon, Cho, Gyejun, Kim, Hye-Lee, Kim, Minsu, Cho, Byungchul, Park, Sangjoon, Jung, Jongwan, Lee, Won-Jun

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