Search Results - Cho, Hang-Sup

  • Showing 1 - 7 results of 7
Refine Results
  1. 1
    Influence of Ball Spacer Size and Density on Liquid Crystal Margin of In-Plane Switching Panel Fabricated by the Inkjet Process

    Influence of Ball Spacer Size and Density on Liquid Crystal Margin of In-Plane Switching Panel Fabricated by the Inkjet Process by Cho, Hang Sup, Kwon, Dhang, Lee, Myoung Ho, Kang, Dong Woo, Kim, Bong Chul, Yu, Sang Jeon

    Get full text
    Items that this one cites
    Items that cite this one
    Article
    Save to List
    Saved in:
  2. 2
    Surface reaction and B atom segregation in ECR chlorine plasma etching of B-doped Si1-xGex epitaxial films

    Surface reaction and B atom segregation in ECR chlorine plasma etching of B-doped Si1-xGex epitaxial films by CHO, Hang-Sup, SAKURABA, Masao, MUROTA, Junichi

    Published in Thin solid films
    Get full text
    Article
    Save to List
    Saved in:
  3. 3
    Study of Improvement of Scan Mura in In-Plane Switching Panel Fabricated by the Inkjet Spacer Process

    Study of Improvement of Scan Mura in In-Plane Switching Panel Fabricated by the Inkjet Spacer Process by Kwon, Dhang, Cho, Hang Sup, Lee, Myoung Ho, Lee, Jeong Hoon, Seo, Hyeon Jin, Kang, Dong Woo, Kim, Bong Chul, Yu, Sang Jeon

    Get full text
    Items that this one cites
    Items that cite this one
    Article
    Save to List
    Saved in:
  4. 4
    Sidewall protection by nitrogen and oxygen in poly-Si1−Ge anisotropic etching using Cl2/N2/O2 plasma

    Sidewall protection by nitrogen and oxygen in poly-Si1−Ge anisotropic etching using Cl2/N2/O2 plasma by Cho, Hang-Sup, Takehiro, Shinobu, Sakuraba, Masao, Murota, Junichi

    Get full text
    Items that this one cites
    Items that cite this one
    Article
    Save to List
    Saved in:
  5. 5
    Surface reaction and B atom segregation in ECR chlorine plasma etching of B-doped Si1−Ge epitaxial films

    Surface reaction and B atom segregation in ECR chlorine plasma etching of B-doped Si1−Ge epitaxial films by Cho, Hang-Sup, Sakuraba, Masao, Murota, Junichi

    Published in Thin solid films
    Get full text
    Items that this one cites
    Article
    Save to List
    Saved in:
  6. 6
    Surface reaction and B atom segregation in ECR chlorine plasma etching of B-doped Si 1− x Ge x epitaxial films

    Surface reaction and B atom segregation in ECR chlorine plasma etching of B-doped Si 1− x Ge x epitaxial films by Cho, Hang-Sup, Sakuraba, Masao, Murota, Junichi

    Published in Thin solid films
    Get full text
    Article
    Save to List
    Saved in:
  7. 7
    Sidewall protection by nitrogen and oxygen in poly-Si 1− x Ge x anisotropic etching using Cl 2/N 2/O 2 plasma

    Sidewall protection by nitrogen and oxygen in poly-Si 1− x Ge x anisotropic etching using Cl 2/N 2/O 2 plasma by Cho, Hang-Sup, Takehiro, Shinobu, Sakuraba, Masao, Murota, Junichi

    Get full text
    Article
    Save to List
    Saved in:

Search Tools: