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SAFE: Unsupervised image feature extraction using self‐attention based feature extraction network
by
Choi, Yeoung Je
,
Lee, Gyeong Taek
,
Kim, Chang Ouk
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Expert systems
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Attention Mechanism-Based Root Cause Analysis for Semiconductor Yield Enhancement Considering the Order of Manufacturing Processes
by
Lee, Min Yong
,
Choi, Yeoung Je
,
Lee, Gyeong Taek
,
Choi, Jongkwan
,
Kim, Chang Ouk
Published in
IEEE transactions on semiconductor manufacturing
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Virtual Metrology Modeling for Wafer Edges via Graph Attention Networks
by
Joo, Jaehyeon
,
Yang, Keun Woo
,
Choi, Yeoung Je
,
Min, Byungwook
,
Kim, Chang Ouk
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IEEE transactions on semiconductor manufacturing
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