Scratch resistance and tribological properties of SiOx incorporated diamond-like carbon films deposited by r.f. plasma assisted chemical vapor deposition by Kumar, N., Barve, S.A., Chopade, S.S., Kar, Rajib, Chand, N., Dash, S., Tyagi, A.K., Patil, D.S.

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EXAFS study on yttrium oxide thin films deposited by RF plasma enhanced MOCVD under the influence of varying RF self-bias by Chopade, S.S., Nayak, C., Bhattacharyya, D., Jha, S.N., Tokas, R.B., Sahoo, N.K., Patil, D.S.

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SiOx containing diamond like carbon coatings: Effect of substrate bias during deposition by Barve, S.A., Chopade, S.S., Kar, R., Chand, N., Deo, M.N., Biswas, A., Patel, N.N., Rao, G.M., Patil, D.S., Sinha, S.

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Effect of substrate heating and microwave attenuation on the catalyst free growth and field emission of carbon nanotubes by Kar, R., Sarkar, S.G., Basak, C.B., Patsha, Avinash, Dhara, Sandip, Ghosh, Chanchal, Ramachandran, Divakar, Chand, N., Chopade, S.S., Patil, D.S.

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Effect of self-bias on the elemental composition and neutron absorption of boron carbide films deposited by RF plasma enhanced CVD by Bute, A., Jagannath, Kar, R., Chopade, S.S., Desai, S.S., Deo, M.N., Rao, Pritty, Chand, N., Kumar, S., Singh, K., Patil, D.S., Sinha, S.

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RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization by Chopade, S.S., Nayak, C., Bhattacharyya, D., Jha, S.N., Tokas, R.B., Sahoo, N.K., Deo, M.N., Biswas, A., Rai, Sanjay, Thulasi Raman, K.H., Rao, G.M., Kumar, Niranjan, Patil, D.S.

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RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition by Chopade, S.S., Barve, S.A., Thulasi Raman, K.H., Chand, N., Deo, M.N., Biswas, A., Rai, Sanjay, Lodha, G.S., Rao, G.M., Patil, D.S.

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Bias-independent growth of carbon nanowalls by microwave electron-cyclotron resonance plasma CVD by Kar, R., Patel, N.N., Chopade, S.S., Mukherjee, S., Das, A.K., Patil, D.S.

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A Co-Operative Intrusion Detection System in Mobile Ad-Hoc Network by Chopade, S.S., Mhala, N.N.

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